Invention Grant
- Patent Title: Etching compositions
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Application No.: US16890077Application Date: 2020-06-02
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Publication No.: US11268025B2Publication Date: 2022-03-08
- Inventor: Emil A. Kneer
- Applicant: Fujifilm Electronic Materials U.S.A., Inc.
- Applicant Address: US RI N. Kingstown
- Assignee: Fujifilm Electronic Materials U.S.A., Inc.
- Current Assignee: Fujifilm Electronic Materials U.S.A., Inc.
- Current Assignee Address: US RI N. Kingstown
- Agency: Fish & Richardson P.C.
- Main IPC: C09K13/00
- IPC: C09K13/00 ; H01L21/306
Abstract:
The present disclosure is directed to etching compositions that are useful for, e.g., selectively removing one or both of titanium nitride (TiN) and cobalt (Co) from a semiconductor substrate without substantially forming a cobalt oxide hydroxide layer.
Information query
