Invention Grant
- Patent Title: Method of manufacturing tantalum carbide coating layer using chemical vapor deposition and tantalum carbide manufactured using the same
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Application No.: US16224284Application Date: 2018-12-18
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Publication No.: US11268189B2Publication Date: 2022-03-08
- Inventor: Dong Wan Jo
- Applicant: TOKAI CARBON KOREA CO., LTD
- Applicant Address: KR Gyeonggi-do
- Assignee: TOKAI CARBON KOREA CO., LTD
- Current Assignee: TOKAI CARBON KOREA CO., LTD
- Current Assignee Address: KR Gyeonggi-do
- Agency: Evan Law Group LLC
- Priority: KR10-2017-0174936 20171219
- Main IPC: C23C16/32
- IPC: C23C16/32 ; C01B32/914 ; C23C16/04 ; C23C16/52 ; C23C16/44
Abstract:
A method of manufacturing a material including tantalum carbide (TaC) with a particularly low impurity content, and a TaC material formed by the method are provided. The method includes preparing a base material, and forming a TaC coating layer on a surface of the base material at a temperature of 1,600° C. to 2,500° C.
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