Invention Grant
- Patent Title: Multi-path combined high-low voltage plasma drilling power source and drillling system
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Application No.: US16733093Application Date: 2020-01-02
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Publication No.: US11268326B2Publication Date: 2022-03-08
- Inventor: Yonghong Liu , Qiang Sun , Qingyun Li , Renjie Ji , Baoping Cai , Xiaopeng Li , Yancong Han , Hang Dong , Xinlei Wu , Peng Liu , Dege Li
- Applicant: China University of Petroleum (East China)
- Applicant Address: CN Shandong
- Assignee: China University of Petroleum (East China)
- Current Assignee: China University of Petroleum (East China)
- Current Assignee Address: CN Shandong
- Agency: IP & T Group LLP
- Priority: CN2019100031996 20190103
- Main IPC: E21B7/15
- IPC: E21B7/15

Abstract:
An embodiment of the present disclosure provides a multi-path combined high-low voltage plasma drilling power source and drilling system. The multi-path combined high-low voltage plasma drilling power source comprises a high-voltage DC circuit, low-voltage DC circuits, high-voltage breakdown modules and an upper computer; wherein the high-voltage DC circuit is connected with the low-voltage DC circuits through cables; the low-voltage DC circuits and the high-voltage breakdown modules simultaneously supply power to plasma generators through cables; the upper computer monitors the low-voltage DC circuits in real time; and the same power source comprises a plurality of low-voltage DC circuits and high-voltage breakdown modules.
Public/Granted literature
- US20200217140A1 MULTI-PATH COMBINED HIGH-LOW VOLTAGE PLASMA DRILLING POWER SOURCE AND DRILLING SYSTEM Public/Granted day:2020-07-09
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