Invention Grant
- Patent Title: Resist composition and patterning process
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Application No.: US16142918Application Date: 2018-09-26
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Publication No.: US11269251B2Publication Date: 2022-03-08
- Inventor: Jun Hatakeyama , Masaki Ohashi
- Applicant: Shin-Etsu Chemical Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JPJP2017-199418 20171013
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/039 ; G03F7/038 ; G03F7/16 ; G03F7/20 ; G03F7/38 ; G03F7/32
Abstract:
A resist composition comprising a base polymer and a sulfonium salt of thiophenecarboxylic acid offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.
Public/Granted literature
- US20190113844A1 RESIST COMPOSITION AND PATTERNING PROCESS Public/Granted day:2019-04-18
Information query
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