Invention Grant
- Patent Title: Flow rate control method and flow rate control device
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Application No.: US17047552Application Date: 2019-04-19
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Publication No.: US11269362B2Publication Date: 2022-03-08
- Inventor: Kaoru Hirata , Shinya Ogawa , Katsuyuki Sugita , Kouji Nishino , Nobukazu Ikeda
- Applicant: FUJIKIN INCORPORATED
- Applicant Address: JP Osaka
- Assignee: FUJIKIN INCORPORATED
- Current Assignee: FUJIKIN INCORPORATED
- Current Assignee Address: JP Osaka
- Agency: Studebaker & Brackett PC
- Priority: JPJP2018-086546 20180427
- International Application: PCT/JP2019/016763 WO 20190419
- International Announcement: WO2019/208417 WO 20191031
- Main IPC: F16K31/02
- IPC: F16K31/02 ; G05D7/06 ; G01F15/00 ; G01F1/34 ; F16K31/00

Abstract:
A flow rate control method performed using a flow rate control device 100 comprising a first control valve 6 provided in a flow path, a second control valve 8 provided downstream of the first control valve, and a pressure sensor 3 for measuring fluid pressure downstream of the first control valve, the method comprising steps of: (a) closing the opening of the first control valve from a state in which, while controlling the opening of the first control valve based on an output of the pressure sensor so as to be the first flow rate, maintaining the opening of the second control valve in an open state, and flowing a fluid at the first flow rate; and (b) based on the output of the pressure sensor, the pressure remaining downstream of the first control valve is controlled by adjusting the opening of the second control valve, and flowing the fluid at the second flow rate downstream of the second control valve.
Public/Granted literature
- US20210157341A1 FLOW RATE CONTROL METHOD AND FLOW RATE CONTROL DEVICE Public/Granted day:2021-05-27
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