Invention Grant
- Patent Title: Low-noise gate-all-around junction field effect transistor
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Application No.: US16843607Application Date: 2020-04-08
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Publication No.: US11271108B2Publication Date: 2022-03-08
- Inventor: Bahman Hekmatshoartabari , Alexander Reznicek , Karthik Balakrishnan
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Lou Percello, Attorney, PLLC
- Agent Daniel P. Morris
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L29/786 ; H01L29/66 ; H01L29/423

Abstract:
A Vertical Function Field Effect Transistor (VIFET) is disclosed with reduced noise and input capacitance and high input impedance. The VIFET has a substrate; a source disposed on the substrate; a drain, and a channel. The vertical channel has one or more channel sidewall surfaces. The channel sidewall surfaces have a total or aggregate channel sidewall surface area. A semiconductor gate grown on one or more of the channel sidewall surfaces has a thickness below 10 nanometers (nm), or between 3 am and 10 om, that reduces transistor noise. The interface surface area between the conductive (e.g. metal) external electrical gate contact and the contacted surface of the semiconductor gate is minimized to further reduce transistor noise.
Public/Granted literature
- US20210320205A1 LOW-NOISE GATE-ALL-AROUND JUNCTION FIELD EFFECT TRANSISTOR Public/Granted day:2021-10-14
Information query
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