Invention Grant
- Patent Title: Spinal implant system and method
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Application No.: US16866996Application Date: 2020-05-05
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Publication No.: US11273046B2Publication Date: 2022-03-15
- Inventor: Jonathan M. Dewey
- Applicant: WARSAW ORTHOPEDIC INC.
- Applicant Address: US IN Warsaw
- Assignee: WARSAW ORTHOPEDIC INC.
- Current Assignee: WARSAW ORTHOPEDIC INC.
- Current Assignee Address: US IN Warsaw
- Agency: Sorell, Lenna & Schmidt, LLP
- Main IPC: A61F2/44
- IPC: A61F2/44 ; A61F2/30

Abstract:
A spinal implant includes a chassis extending along a first axis and including a first thread. A first member extends along a second axis and is pivotably coupled to the chassis. A second member extends along a third axis between and is pivotably coupled to the chassis. A rack includes opposite top and bottom surfaces. A first spur is coupled to the first member such that the first spur engages the top surface. A second spur is coupled to the second member such that the second spur engages the bottom surface. An actuator includes second thread that engages the first thread such that rotation of the actuator move the implant between a first orientation in which the second and third axes extend parallel to the first axis and a second orientation in which the second and third axes extends at an acute angle relative to the first axis.
Public/Granted literature
- US20210346167A1 SPINAL IMPLANT SYSTEM AND METHOD Public/Granted day:2021-11-11
Information query
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