- Patent Title: Partition wall pattern film and method of manufacturing the same
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Application No.: US16500305Application Date: 2019-03-14
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Publication No.: US11275263B2Publication Date: 2022-03-15
- Inventor: Yong Goo Son , Nam Seok Bae , Seung Heon Lee
- Applicant: LG Chem, Ltd.
- Applicant Address: KR Seoul
- Assignee: LG Chem, Ltd.
- Current Assignee: LG Chem, Ltd.
- Current Assignee Address: KR Seoul
- Agency: Lerner, David, Littenberg, Krumholz & Mentlik, LLP
- Priority: KR10-2018-0044325 20180417
- International Application: PCT/KR2019/002948 WO 20190314
- International Announcement: WO2019/203446 WO 20191024
- Main IPC: G02F1/1333
- IPC: G02F1/1333 ; G02F1/1681 ; G02F1/167
Abstract:
A partition wall pattern film including a transparent substrate; a first electrode layer provided on the transparent substrate; a partition wall pattern provided on the first electrode layer; and a second electrode layer pattern provided on an entire upper surface of the partition wall pattern and at least a part of a lateral surface of the partition wall pattern.
Public/Granted literature
- US20200319496A1 Partition Wall Pattern Film And Method Of Manufacturing The Same Public/Granted day:2020-10-08
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