Invention Grant
- Patent Title: Resist composition and method of forming resist pattern
-
Application No.: US16686712Application Date: 2019-11-18
-
Publication No.: US11275306B2Publication Date: 2022-03-15
- Inventor: Takahiro Kojima , Yasuhiro Yoshii , Masahito Yahagi , Yoichi Hori
- Applicant: TOKYO OHKA KOGYO CO., LTD.
- Applicant Address: JP Kawasaki
- Assignee: TOKYO OHKA KOGYO CO., LTD.
- Current Assignee: TOKYO OHKA KOGYO CO., LTD.
- Current Assignee Address: JP Kawasaki
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: JPJP2018-228560 20181205
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/039 ; G03F7/30 ; G03F7/20 ; G03F7/029 ; G03F7/38

Abstract:
A resist composition including a compound (D0) formed of an anion moiety and a cation moiety which is represented by Formula (d0), and a resin component (A1) which has a constitutional unit (a0) obtained from a compound represented by Formula (a0-1), in which a polymerizable group at a W portion is converted into a main chain, and a constitutional unit (a1) containing an acid decomposable group whose polarity is increased due to an action of an acid. In Formula (d0), Rd0 represents a substituent and n represents an integer of 2 or greater. In Formula (a0-1), Wax0 represents an (nax0+1)-valent aromatic hydrocarbon group which may have a substituent.
Public/Granted literature
- US20200183275A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN Public/Granted day:2020-06-11
Information query
IPC分类: