Invention Grant
- Patent Title: Systems and methods for photolithographic design
-
Application No.: US17003193Application Date: 2020-08-26
-
Publication No.: US11275884B2Publication Date: 2022-03-15
- Inventor: Fedor G. Pikus
- Applicant: Siemens Industry Software Inc.
- Applicant Address: US TX Plano
- Assignee: Siemens Industry Software Inc.
- Current Assignee: Siemens Industry Software Inc.
- Current Assignee Address: US TX Plano
- Main IPC: G06F30/34
- IPC: G06F30/34 ; G06F30/398 ; G06F30/327 ; G06F30/392 ; G06F30/394

Abstract:
A method of identifying elements in a design layout having multiple levels of hierarchical cells, each cell having one or more geometric elements, may include selecting a cell from a list of candidate cells for a level of a hierarchy; applying a local rule to the selected cell; identifying each selected cell that includes a geometric element that passes the local rule; building a list of candidate cells for a next-higher level of the hierarchy according to the identified cells; repeating the selecting, identifying, and building operations for each higher level of the hierarchy; and when a highest level of the hierarchy has been processed, returning and storing the list of candidate cells as the global solution for the applied local rule.
Information query