Invention Grant
- Patent Title: Charged particle beam optical system, exposure apparatus, exposure method and device manufacturing method
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Application No.: US16492677Application Date: 2017-03-16
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Publication No.: US11276546B2Publication Date: 2022-03-15
- Inventor: Takehisa Yahiro
- Applicant: NIKON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: NIKON CORPORATION
- Current Assignee: NIKON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- International Application: PCT/JP2017/010742 WO 20170316
- International Announcement: WO2018/167924 WO 20180920
- Main IPC: H01J37/141
- IPC: H01J37/141 ; G03F7/20 ; H01J37/09 ; H01J37/317 ; H01L21/027

Abstract:
A charged particle beam optical system is provided with a plurality of irradiation optical systems each of which irradiates an object W with a charged particle beam EB, the plurality of irradiation optical system includes a first irradiation optical system and a second irradiation optical system that generates a second magnetic field having a characteristics different from a characteristics of a first magnetic field generated by the first irradiation optical system.
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