Invention Grant
- Patent Title: Asymmetrical sealing and gas flow control device
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Application No.: US16053203Application Date: 2018-08-02
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Publication No.: US11276585B2Publication Date: 2022-03-15
- Inventor: June Hee Lee , Young Jong Yoon , Seok Heon Yu , Pill Kyu Jin , Jeong Woo Woo
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2018-0011597 20180130
- Main IPC: H01L21/67
- IPC: H01L21/67 ; C23C16/455 ; C23C16/44 ; H01J37/32 ; C23C16/458 ; F16K1/34 ; H01L21/687

Abstract:
A sealing device configured for use in a vacuum chamber between a reaction region of the vacuum chamber and an exhaust port includes a ring-shaped body with an upper surface and a lower surface. A distance between the upper surface and the lower surface of the sealing device is a thickness of the ring-shaped body. The thickness of the ring-shaped body differs along a circumference of the ring-shaped body such that the ring-shaped body has a wedge shape. The thickness of the ring-shaped body, around its circumference is dependent upon a structure of the exhaust port.
Public/Granted literature
- US20190237344A1 ASYMMETRICAL SEALING AND GAS FLOW CONTROL DEVICE Public/Granted day:2019-08-01
Information query
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