Invention Grant
- Patent Title: Multilayered memory device with through-silicon via(TSV), semiconductor device and method for manufacturing the same
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Application No.: US17102104Application Date: 2020-11-23
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Publication No.: US11276671B2Publication Date: 2022-03-15
- Inventor: Chih-Wei Chang
- Applicant: Changxin Memory Technologies, Inc.
- Applicant Address: CN Anhui
- Assignee: Changxin Memory Technologies, Inc.
- Current Assignee: Changxin Memory Technologies, Inc.
- Current Assignee Address: CN Anhui
- Agency: Sheppard Mullin Richter & Hampton LLP
- Priority: CN201811015659.9 20180831,CN201821428686.4 20180831
- Main IPC: H01L25/065
- IPC: H01L25/065 ; H01L21/768 ; H01L23/48 ; H01L23/00 ; H01L25/00

Abstract:
A memory device, a semiconductor device and their manufacturing methods are provided. One of the methods may include: providing a first die and a plurality of second dies, the first die having a first pad, each of the plurality of second dies having a second pad; stacking the plurality of second dies on the first die, the second pads and the first pad arranged in a stepwise manner, and projections of the second pads of any two adjacent second dies on the first die partially overlapped; forming a connecting hole passing through the second dies; and forming a conductive body filling the connecting hole and connecting the first pad and the second pads. This method simplifies the manufacturing process of a semiconductor device, reduces the cost thereof, and improves the production yield.
Public/Granted literature
- US20210074685A1 MEMORY DEVICE, SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2021-03-11
Information query
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