Invention Grant
- Patent Title: Method of controlling chemical concentration in electrolyte and semiconductor apparatus
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Application No.: US16277945Application Date: 2019-02-15
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Publication No.: US11280021B2Publication Date: 2022-03-22
- Inventor: Yung-Chang Huang , You-Fu Chen , Yu-Chi Tsai , Chu-Ting Chang
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Maschoff Brennan
- Main IPC: C25D21/18
- IPC: C25D21/18 ; H01L21/288 ; H01L21/66 ; H01L21/02 ; H01L21/67 ; C25D3/38 ; C25D17/02 ; C25D21/04 ; C25D7/12 ; C25D21/08 ; C25D17/00 ; F16K31/50 ; F16K3/02 ; F16K31/04
Abstract:
A method of controlling chemical concentration in electrolyte includes measuring a chemical concentration in an electrolyte, wherein the electrolyte is contained in a tank; and increasing a vapor flux through an exhaust pipe connected to the tank when the measured chemical concentration is lower than a control lower limit value.
Public/Granted literature
- US20190323142A1 METHOD OF CONTROLLING CHEMICAL CONCENTRATION IN ELECTROLYTE AND SEMICONDUCTOR APPARATUS Public/Granted day:2019-10-24
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