Invention Grant
- Patent Title: Method for via formation by micro-imprinting
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Application No.: US16192546Application Date: 2018-11-15
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Publication No.: US11281094B2Publication Date: 2022-03-22
- Inventor: Roman Gouk , Giback Park , Kyuil Cho , Han-Wen Chen , Chintan Buch , Steven Verhaverbeke , Vincent Dicaprio
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan, LLP
- Main IPC: G03F7/038
- IPC: G03F7/038 ; G03F7/00 ; H01L21/768 ; G03F7/20

Abstract:
A method and apparatus for forming a plurality of vias in panels for advanced packaging applications is disclosed, according to one embodiment. A redistribution layer is deposited on a substrate layer. The redistribution layer may be deposited using a spin coating process, a spray coating process, a drop coating process, or lamination. The redistribution layer is then micro-imprinted using a stamp inside a chamber. The redistribution layer and the stamp are then baked inside the chamber. The stamp is removed from the redistribution layer to form a plurality of vias in the redistribution layer. Excess residue built-up on the redistribution layer may be removed using a descumming process. A residual thickness layer disposed between the bottom of each of the plurality of vias and the top of the substrate layer may have thickness of less than about 1 μm.
Public/Granted literature
- US20200159113A1 METHOD FOR VIA FORMATION BY MICRO-IMPRINTING Public/Granted day:2020-05-21
Information query
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