Invention Grant
- Patent Title: Methods and apparatus for test pattern forming and film property measurement
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Application No.: US16820447Application Date: 2020-03-16
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Publication No.: US11289386B2Publication Date: 2022-03-29
- Inventor: Bulent Mehmet Basol , Jalal Ashjaee , Abhijeet Joshi
- Applicant: Active Layer Parametrics, Inc.
- Applicant Address: US CA Scotts Valley
- Assignee: Active Layer Parametrics, Inc.
- Current Assignee: Active Layer Parametrics, Inc.
- Current Assignee Address: US CA Scotts Valley
- Agency: Kubota & Basol LLP
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/66 ; H01L21/326 ; G01R31/26 ; H01L21/02 ; H01L21/67
Abstract:
A method for electrically characterizing a layer disposed on a substrate and electrically insulated from the substrate is disclosed. The method can include forming a test pattern, contacting the test pattern with electrical contact elements at contact regions, and measuring an electrical parameter of the layer by passing a first set of test currents between contact regions. The test pattern can be formed by pushing a pattern forming head against a top surface of the layer, introducing a first fluid into the cavity, and converting the sacrificial portion of the layer into an insulator using the first fluid and forming the test pattern under the test-pattern-shaped inner seal.
Public/Granted literature
- US20200219778A1 METHODS AND APPARATUS FOR TEST PATTERN FORMING AND FILM PROPERTY MEASUREMENT Public/Granted day:2020-07-09
Information query
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