Invention Grant
- Patent Title: Semiconductor storage device and method for producing semiconductor storage device
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Application No.: US17009588Application Date: 2020-09-01
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Publication No.: US11289496B2Publication Date: 2022-03-29
- Inventor: Kosei Noda
- Applicant: KIOXIA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: KIOXIA CORPORATION
- Current Assignee: KIOXIA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Kim & Stewart LLP
- Priority: JPJP2019-170525 20190919
- Main IPC: H01L27/115
- IPC: H01L27/115 ; H01L21/768 ; H01L23/532 ; H01L23/522 ; H01L21/311

Abstract:
According to one embodiment, a semiconductor storage device includes a stacked body above a substrate. The stacked body includes a first stacked region in which a first insulating layer and a second insulating layer are alternately stacked and a second stacked region in which a conductive layer and the first insulating layer are alternately stacked. The semiconductor storage device includes a memory pillar that extends through the second stacked region of the stacked body in a stacking direction. The second insulating layer comprising a first insulating material within the first stacked region and a second insulating material on ends of the second insulating layer in a direction intersecting to the stacking direction.
Public/Granted literature
- US20210091092A1 SEMICONDUCTOR STORAGE DEVICE AND METHOD FOR PRODUCING SEMICONDUCTOR STORAGE DEVICE Public/Granted day:2021-03-25
Information query
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