Invention Grant
- Patent Title: Three-dimensional semiconductor memory device and method of fabricating the same
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Application No.: US16777776Application Date: 2020-01-30
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Publication No.: US11289504B2Publication Date: 2022-03-29
- Inventor: Woosung Yang , Dong-Sik Lee , Sung-Min Hwang , Joon-Sung Lim
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Muir Patent Law, PLLC
- Priority: KR10-2019-0075814 20190625
- Main IPC: H01L27/11582
- IPC: H01L27/11582 ; H01L27/11526 ; H01L27/11556 ; H01L23/528 ; H01L27/11519 ; H01L27/11565 ; H01L27/11573 ; H01L23/522 ; H01L21/28 ; H01L29/66

Abstract:
A three-dimensional semiconductor memory device may include horizontal patterns disposed on a peripheral circuit structure and spaced apart from each other, memory structures provided on the horizontal patterns, respectively, each of the memory structures including a three-dimensional arrangement of memory cells. Penetrating insulating patterns and separation structures may isolate the horizontal patterns from one another. Through vias may extend through the penetrating insulating patterns to connect logic circuits of the peripheral circuit structure to the memory structure.
Information query
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