Invention Grant
- Patent Title: Negative capacitance semiconductor sensor
-
Application No.: US16717991Application Date: 2019-12-17
-
Publication No.: US11289601B2Publication Date: 2022-03-29
- Inventor: Mihai Adrian Ionescu , Francesco Bellando , Ali Saeidi
- Applicant: ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL)
- Applicant Address: CH Lausanne
- Assignee: ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL)
- Current Assignee: ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL)
- Current Assignee Address: CH Lausanne
- Agency: Maschoff Brennan
- Priority: EP18213348 20181218
- Main IPC: H01L29/78
- IPC: H01L29/78 ; G01N27/414 ; H01L29/66 ; H01L29/51

Abstract:
A semiconductor sensor includes a source element; a drain element; and a semiconductor channel element between the source element and the drain element, forming an electrically conductive channel. An insulator is positioned between the semiconductor channel element and a solution to be sensed. A reference contacts the solution and sets an electric potential of the solution. A bias voltage source generates an external sensor bias voltage for electrically biasing the reference electrode. A sensing surface interacts with the solution comprising analytes for generating a surface potential change at the sensing surface dependent on the concentration of analytes. The sensor further includes a ferroelectric capacitance element between the insulator and the bias voltage source for generating a negative capacitance for a differential gain between the external sensor bias voltage and an internal sensor bias voltage sensed at a surface of the channel element facing the insulator or ferroelectric capacitance element.
Information query
IPC分类: