Invention Grant
- Patent Title: Structurally controlled deposition of silicon onto nanowires
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Application No.: US15931470Application Date: 2020-05-13
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Publication No.: US11289701B2Publication Date: 2022-03-29
- Inventor: Weijie Wang , Zuqin Liu , Song Han , Jonathan Bornstein , Constantin Ionel Stefan
- Applicant: Amprius, Inc.
- Applicant Address: US CA Fremont
- Assignee: Amprius, Inc.
- Current Assignee: Amprius, Inc.
- Current Assignee Address: US CA Fremont
- Agency: Weaver Austin Villeneuve & Sampson LLP
- Main IPC: H01M4/38
- IPC: H01M4/38 ; H01M4/04 ; H01M4/134 ; H01M4/36 ; H01M4/02 ; H01M10/0525 ; H01M4/1395 ; H01M10/052

Abstract:
Provided herein are nanostructures for lithium ion battery electrodes and methods of fabrication. In some embodiments, a nanostructure template coated with a silicon coating is provided. The silicon coating may include a non-conformal, more porous layer and a conformal, denser layer on the non-conformal, more porous layer. In some embodiments, two different deposition processes, e.g., a PECVD layer to deposit the non-conformal layer and a thermal CVD process to deposit the conformal layer, are used. Anodes including the nanostructures have longer cycle lifetimes than anodes made using either a PECVD or thermal CVD method alone.
Public/Granted literature
- US20200274156A1 STRUCTURALLY CONTROLLED DEPOSITION OF SILICON ONTO NANOWIRES Public/Granted day:2020-08-27
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