Invention Grant
- Patent Title: Cyclic sulfonate compounds as photoacid generators in resist applications
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Application No.: US16495719Application Date: 2019-03-14
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Publication No.: US11292764B2Publication Date: 2022-04-05
- Inventor: Yongqiang Zhang , Ram B. Sharma
- Applicant: HERAEUS EPURIO LLC
- Applicant Address: US OH Vandalia
- Assignee: HERAEUS EPURIO LLC
- Current Assignee: HERAEUS EPURIO LLC
- Current Assignee Address: US OH Vandalia
- Agency: Stradley Ronon Stevens & Young, LLP
- International Application: PCT/US2019/022252 WO 20190314
- International Announcement: WO2019/178344 WO 20190919
- Main IPC: C07C309/10
- IPC: C07C309/10 ; G03F7/004 ; C07C381/12
Abstract:
Novel photoacid generator compounds are provided. Compositions that include the novel photoacid generator compounds are also provided. The present disclosure further provides methods of making and using the photoacid generator compounds and compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
Public/Granted literature
- US20210002213A9 CYCLIC SULFONATE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS Public/Granted day:2021-01-07
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