Invention Grant
- Patent Title: Method for vapor depositing a substrate
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Application No.: US16338133Application Date: 2018-09-06
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Publication No.: US11293090B2Publication Date: 2022-04-05
- Inventor: Jiyu Wan , Dong Wang , Yongzhi Song , Jingjing Jiang , Pengyu Qi
- Applicant: Beijing BOE Display Technology Co., Ltd. , BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Beijing; CN Beijing
- Assignee: Beijing BOE Display Technology Co., Ltd.,BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee: Beijing BOE Display Technology Co., Ltd.,BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee Address: CN Beijing; CN Beijing
- Agency: Arch & Lake LLP
- Priority: CN201711338456.9 20171214
- International Application: PCT/CN2018/104292 WO 20180906
- International Announcement: WO2019/114335 WO 20190620
- Main IPC: C23C14/28
- IPC: C23C14/28 ; C23C14/35 ; C23C14/34 ; C03C25/226

Abstract:
The present disclosure relates to the field of vapor deposition technologies, and discloses a vapor deposition method. The vapor deposition method includes: applying an exciting acoustic wave to the target, such that particles in a predetermined location of the target break away from the target and adhere to a predetermined region of the substrate when an energy of the particles is higher than an energy required for the particles to break away from the target. By using the vapor deposition method, losses of vapor deposition materials may be avoided, utilization of the vapor deposition materials may be increased, and thus costs may be reduced.
Public/Granted literature
- US20210156022A1 VAPOR DEPOSITION METHOD AND VAPOR DEPOSITION APPARATUS Public/Granted day:2021-05-27
Information query
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