Invention Grant
- Patent Title: System and method for repeated metal deposition-dewetting steps to form a nano-particle etching mask producing thicker layer of engraved metasurface
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Application No.: US16875337Application Date: 2020-05-15
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Publication No.: US11294103B2Publication Date: 2022-04-05
- Inventor: Eyal Feigenbaum , Nathan James Ray , Jae Hyuck Yoo
- Applicant: Lawrence Livermore National Security, LLC
- Applicant Address: US CA Livermore
- Assignee: Lawrence Livermore National Security, LLC
- Current Assignee: Lawrence Livermore National Security, LLC
- Current Assignee Address: US CA Livermore
- Agency: Harness Dickey & Pierce PLC
- Main IPC: G02B1/12
- IPC: G02B1/12 ; G02B1/00 ; G02B1/11

Abstract:
A method and system is disclosed for creating an optical component having a spatially controlled refractive index and uniform anti-reflective layer. The method may involve alternately depositing and dewetting two or more thin metal material layers on the substrate to form a mask having a spatially varying nano-particle distribution, and with an increased thickness beyond what could be achieved using a single, thick layer of the same material. The substrate may then be etched, using the mask, to imprint a spatially patterned nanostructure pattern on a surface the substrate in accordance with the mask.
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