Invention Grant
- Patent Title: Manufacturing method for electro-optical device, electro-optical device, and electronic apparatus
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Application No.: US17037704Application Date: 2020-09-30
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Publication No.: US11294222B2Publication Date: 2022-04-05
- Inventor: Shotaro Izawa
- Applicant: SEIKO EPSON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: SEIKO EPSON CORPORATION
- Current Assignee: SEIKO EPSON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: JCIPRNET
- Priority: JPJP2019-185024 20191008
- Main IPC: H01L27/12
- IPC: H01L27/12 ; G02F1/1335 ; G02F1/1362 ; G02F1/1368

Abstract:
A manufacturing method of a lens layer, including a first layer and a second layer for an electro-optical device, includes forming a first transmissive layer at a concave surface of an translucency insulating layer, forming, with a different material from the first transmissive layer, a first sacrificial layer on first transmissive layer, polishing its surface, to form a first layer being a residual portion of the first transmissive layer and a sacrificial layer residual portion being a residual portion of the first sacrificial layer, removing the sacrificial layer residual portion, forming a second transmissive layer at the first layer, forming, using a different material from the second transmissive layer, a second sacrificial layer on the second transmissive layer, and polishing the second transmissive layer and the second sacrificial layer to form a second layer from the second transmissive layer.
Public/Granted literature
- US20210103184A1 MANUFACTURING METHOD FOR ELECTRO-OPTICAL DEVICE, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC APPARATUS Public/Granted day:2021-04-08
Information query
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