Invention Grant
- Patent Title: Process of imprinting a substrate with fluid control features
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Application No.: US16045401Application Date: 2018-07-25
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Publication No.: US11294277B2Publication Date: 2022-04-05
- Inventor: Niyaz Khusnatdinov , Edward Brian Fletcher
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agent Daniel Ratoff
- Main IPC: G03F7/00
- IPC: G03F7/00 ; B29C59/02 ; B82Y40/00 ; B82Y10/00

Abstract:
A process, system, and method of manufacturing an article on a substrate having a fluid control feature. The fluid control feature may include at least one depressed region formed along an edge of an imprint field. Formable material is deposited in the imprint field of the substrate. A template is moved such that the template comes into contact with the formable material in the imprint field. While the template comes into contact with the formable material, the formable material may flow into the fluid control feature.
Public/Granted literature
- US20200033719A1 Process of Imprinting a Substrate with Fluid Control Features Public/Granted day:2020-01-30
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