Invention Grant
- Patent Title: Photosensitive resin composition, photosensitive resin laminate, and pattern forming process
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Application No.: US16299702Application Date: 2019-03-12
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Publication No.: US11294283B2Publication Date: 2022-04-05
- Inventor: Yoichiro Ichioka
- Applicant: Shin-Etsu Chemical Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JPJP2018-056546 20180323
- Main IPC: G03F7/07
- IPC: G03F7/07 ; G03F7/075 ; G03F7/004 ; G03F7/038 ; G03F7/105 ; C08G73/10 ; G03F7/11 ; G03F7/115

Abstract:
A photosensitive resin composition is provided comprising 100 pbw of a polyimide silicone containing a primary alcoholic hydroxyl group, a crosslinker, a photoacid generator, a polyfunctional epoxy compound, 1-70 pbw of a filler having an average particle size of 0.01-20.0 μm, and 0.01-30 pbw of a colorant. The resin composition is colored and photosensitive and cures into a product having an improved modulus.
Public/Granted literature
- US20190294045A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAMINATE, AND PATTERN FORMING PROCESS Public/Granted day:2019-09-26
Information query
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