Invention Grant
- Patent Title: Pressure regulating device and semiconductor production system
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Application No.: US16726697Application Date: 2019-12-24
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Publication No.: US11295964B2Publication Date: 2022-04-05
- Inventor: Ming-Hsiang Yang
- Applicant: GENES TECH CO., LTD.
- Applicant Address: TW Zhubei
- Assignee: GENES TECH CO., LTD.
- Current Assignee: GENES TECH CO., LTD.
- Current Assignee Address: TW Zhubei
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Priority: TW108140885 20191111
- Main IPC: H01L21/67
- IPC: H01L21/67 ; F04B49/08 ; F04B49/06 ; F04B49/10 ; F04B49/20

Abstract:
A pressure regulating device cooperates with a semiconductor production system to regulate a pressure in a pipe of a semiconductor production apparatus in the semiconductor production system. The pressure regulating device reduces the pressure in the pipe of the semiconductor apparatus by a suction pump to prevent from liquid leakage when the pipe is broken. In addition, the pressure regulating device can periodically record the pressure change in the pipe to facilitate an operator to judge whether the pipe is damaged and analyze the cause of decrease in production yield.
Public/Granted literature
- US20210143025A1 PRESSURE REGULATING DEVICE AND SEMICONDUCTOR PRODUCTION SYSTEM Public/Granted day:2021-05-13
Information query
IPC分类: