- Patent Title: Feedback 1T DRAM device having localized partial insulating layers
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Application No.: US16726506Application Date: 2019-12-24
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Publication No.: US11296086B2Publication Date: 2022-04-05
- Inventor: Seongjae Cho
- Applicant: Gachon University of Industry-Academic cooperation Foundation
- Assignee: Gachon University of Industry-Academic cooperation Foundation
- Current Assignee: Gachon University of Industry-Academic cooperation Foundation
- Agent Gerald E. Hespos; Michael J. Porco; Matthew T. Hespos
- Priority: KR10-2019-0105435 20190827
- Main IPC: H01L27/108
- IPC: H01L27/108 ; H01L29/78

Abstract:
A feedback 1T DRAM device that has a partial insulating film structure is provided. A body region may be divided into two or more in a channel direction by pn junctions and/or partial insulating layers, and gates may be formed on each of the divided body regions. The present invention can be operated by filling and subtracting electrons in the energy well of the conduction band and holes in the energy well of the valence band, respectively. In addition, it is possible to maximize retention time and improve operation reliability by reducing carrier loss by energy barriers of pn junctions and/or partial insulating layers.
Public/Granted literature
- US20210066299A1 FEEDBACK 1T DRAM DEVICE HAVING LOCALIZED PARTIAL INSULATING LAYERS Public/Granted day:2021-03-04
Information query
IPC分类: