Invention Grant
- Patent Title: Semiconductor memory device and manufacturing method of semiconductor memory device
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Application No.: US16800812Application Date: 2020-02-25
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Publication No.: US11296111B2Publication Date: 2022-04-05
- Inventor: Yosuke Mitsuno , Tatsufumi Hamada , Shinichi Sotome , Tomohiro Kuki , Yuya Akeboshi
- Applicant: KIOXIA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: KIOXIA CORPORATION
- Current Assignee: KIOXIA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Kim & Stewart LLP
- Priority: JPJP2019-137855 20190726
- Main IPC: H01L27/11582
- IPC: H01L27/11582 ; H01L27/11524 ; H01L27/1157 ; H01L27/11556 ; H01L21/28

Abstract:
According to one embodiment, a semiconductor memory device includes a stacked body of first conductor layers and second conductor layers. A pillar including a semiconductor layer extends along through the stacked body in a first direction. A charge storage layer is between the conductor layers and the semiconductor layer. The semiconductor layer includes a first portion extending along the first direction from an uppermost first conductor layer to a lowermost second conductor layer and a second portion above the first portion in the first direction. The second portion has a diameter that decreases with increasing distance along the first direction from the first portion.
Public/Granted literature
- US20210028189A1 SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR MEMORY DEVICE Public/Granted day:2021-01-28
Information query
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