Invention Grant
- Patent Title: Magnetoresistive memory device and method of manufacturing magnetoresistive memory device
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Application No.: US16816398Application Date: 2020-03-12
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Publication No.: US11296146B2Publication Date: 2022-04-05
- Inventor: Shuichi Tsubata
- Applicant: KIOXIA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: KIOXIA CORPORATION
- Current Assignee: KIOXIA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Holtz, Holtz & Volek PC
- Priority: JPJP2019-164886 20190910
- Main IPC: H01L27/22
- IPC: H01L27/22 ; H01L43/02 ; G11C11/16 ; H01L43/12 ; H01L43/10

Abstract:
According to an embodiment, a magnetoresistive memory device includes a first conductor with a first surface. A first structure on the first surface of the first conductor includes a first ferromagnetic layer. An insulating layer is on the first structure. A second structure on the insulating layer includes a second ferromagnetic layer. A second conductor is in contact with the first surface of the first conductor and a side surface of the first structure. A first insulator on the second conductor covers a side surface of the insulating layer, and is in contact with the side surface of the first structure and a side surface of the second structure. A third conductor on the first insulator is in contact with the side surface of the second structure.
Public/Granted literature
- US20210074762A1 MAGNETORESISTIVE MEMORY DEVICE AND METHOD OF MANUFACTURING MAGNETORESISTIVE MEMORY DEVICE Public/Granted day:2021-03-11
Information query
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