Invention Grant
- Patent Title: Switching device having gate stack with low oxide growth
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Application No.: US16649183Application Date: 2017-12-26
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Publication No.: US11296203B2Publication Date: 2022-04-05
- Inventor: Willy Rachmady , Cheng-Ying Huang , Gilbert Dewey
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Trop, Pruner & Hu, P.C.
- International Application: PCT/US2017/068390 WO 20171226
- International Announcement: WO2020/081040 WO 20200423
- Main IPC: H01L29/51
- IPC: H01L29/51 ; H01L21/285 ; H01L23/16 ; H01L23/367 ; H01L23/00 ; H01L27/092 ; H01L29/08 ; H01L29/45 ; H01L29/66 ; H01L29/78

Abstract:
An embodiment includes a system comprising: a switching device that includes a fin; and a source contact on a source, a gate contact on a channel, and a drain contact on a drain; wherein the gate contact includes: (a)(i) a first layer that includes oxygen, the first layer directly contacting the fin, (a)(ii) a second layer that includes a dielectric material, (c) a third layer that includes at least one of aluminum, titanium, ruthenium, zirconium, hafnium, tantalum, niobium, vanadium, thorium, barium, magnesium, cerium, and lanthanum, and (a)(iii) a fourth layer that includes a metal, wherein (b)(i) the source contact, the gate contact, and the drain contact are all on the fin, and (b)(ii) the second layer is between the first and fourth layers. Other embodiments are described herein.
Public/Granted literature
- US20210074828A1 SWITCHING DEVICE HAVING GATE STACK WITH LOW OXIDE GROWTH Public/Granted day:2021-03-11
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