Invention Grant
- Patent Title: Semiconductor device
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Application No.: US15930806Application Date: 2020-05-13
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Publication No.: US11296218B2Publication Date: 2022-04-05
- Inventor: Ralf Siemieniec , Adam Amali , Michael Hutzler , Laszlo Juhasz , David Laforet , Cedric Ouvrard , Li Juin Yip
- Applicant: Infineon Technologies Austria AG
- Applicant Address: AT Villach
- Assignee: Infineon Technologies Austria AG
- Current Assignee: Infineon Technologies Austria AG
- Current Assignee Address: AT Villach
- Agency: Murphy, Bilak & Homiller, PLLC
- Priority: EP19174732 20190515
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L29/40 ; H01L29/06 ; H01L29/423

Abstract:
A semiconductor device includes a semiconductor body having first and second opposing surfaces, an active area including active transistor cells, and an edge termination region laterally surrounding the active area. Each active transistor cell includes a mesa and a columnar trench having a field plate. The edge termination region includes inactive cells each including a columnar termination trench having a field plate, and a termination mesa including a drift region of a first conductivity type. The edge termination region includes a transition region laterally surrounding the active region and an outer termination region laterally surrounding the transition region. In the transition region, the termination mesa includes a body region of a second conductivity type arranged on the drift region. In the outer termination region, the drift region extends to the first surface. A buried doped region of the edge termination region is positioned in the transition and outer termination regions.
Information query
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