Invention Grant
- Patent Title: Surface MESFET
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Application No.: US16353548Application Date: 2019-03-14
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Publication No.: US11296239B2Publication Date: 2022-04-05
- Inventor: Sami Kallioinen , Helena Pohjonen
- Applicant: EMBERION OY
- Applicant Address: FI Espoo
- Assignee: EMBERION OY
- Current Assignee: EMBERION OY
- Current Assignee Address: FI Espoo
- Agency: Squire Patton Boggs (US) LLP
- Priority: FI20185237 20180314
- Main IPC: H01L29/08
- IPC: H01L29/08 ; H01L29/812 ; H01L23/528 ; H01L29/417 ; H01L29/423 ; H01L27/095 ; H01L27/146 ; H01L29/66 ; H01L29/40 ; H01L29/10 ; H01L29/24 ; H01L27/06 ; H01L31/112 ; H01L21/8238 ; H01L29/45

Abstract:
A MESFET transistor on a horizontal substrate surface with at least one wiring layer on the substrate surface. The transistor comprises source, drain and gate electrodes which are at least partly covered by a semiconducting channel layer. The source, drain and gate electrodes optionally comprise interface contact materials for changing the junction type between each electrode and the channel. The interface between the source electrode and the channel is an ohmic junction, the interface between the drain electrode and the channel is an ohmic junction, and the interface between the gate electrode and the channel is a Schottky junction. The substrate is a CMOS substrate.
Public/Granted literature
- US20190288123A1 SURFACE MESFET Public/Granted day:2019-09-19
Information query
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