Invention Grant
- Patent Title: Variable resistance memory device having an anti-oxidation layer and a method of manufacturing the same
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Application No.: US16589456Application Date: 2019-10-01
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Publication No.: US11296277B2Publication Date: 2022-04-05
- Inventor: Sanghoon Ahn , Oik Kwon , Jeonghee Park , Kihyun Hwang
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2019-0037630 20190401,KR10-2019-0060777 20190523
- Main IPC: H01L43/08
- IPC: H01L43/08 ; H01L27/22 ; H01L27/24 ; H01L45/00 ; H01L43/12 ; H01L43/10

Abstract:
A variable resistance memory device is provided including a plurality of lower electrodes disposed on a substrate. A plurality of variable resistors are disposed on the plurality of lower electrodes. A plurality of upper electrodes are disposed on the plurality of variable resistors. An interlayer insulating layer fills a space in the plurality of variable resistors. An anti-oxidation layer is disposed between the plurality of variable resistors and the interlayer insulating layer. The anti-oxidation layer covers side surfaces of the plurality of variable resistors, and the anti-oxidation layer comprises silicon and/or carbon.
Information query
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