Invention Grant
- Patent Title: Method for manufacturing optical device
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Application No.: US17252788Application Date: 2019-06-04
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Publication No.: US11300729B2Publication Date: 2022-04-12
- Inventor: Eiichi Kuramochi , Hisashi Sumikura , Masaaki Ono , Akihiko Shinya , Masaya Notomi
- Applicant: Nippon Telegraph and Telephone Corporation
- Applicant Address: JP Tokyo
- Assignee: Nippon Telegraph and Telephone Corporation
- Current Assignee: Nippon Telegraph and Telephone Corporation
- Current Assignee Address: JP Tokyo
- Agency: Slater Matsil, LLP
- Priority: JPJP2018-119531 20180625
- International Application: PCT/JP2019/022150 WO 20190604
- International Announcement: WO2020/003918 WO 20200102
- Main IPC: G02B6/13
- IPC: G02B6/13 ; B82Y40/00 ; G02B6/122 ; G02B5/00 ; H01S3/063

Abstract:
An active medium piece (109), which has been taken out using a nanoprobe (108), is processed so as to match the shape of a nanoslot (104), and thus an active medium small piece (111) that is smaller than the active medium piece (109) is formed (a fourth step). For example, irradiation with an ion beam (110) is performed so that the active medium piece (109) is shaped (processed) into an active medium small piece (111) that has a three-dimensional shape suitable for being placed in the nanoslot (104). The active medium piece (109) is processed into the active medium small piece (111) in the state of being held by the nanoprobe (108).
Public/Granted literature
- US20210215877A1 Method for Manufacturing Optical Device Public/Granted day:2021-07-15
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