Invention Grant
- Patent Title: Substrate support device and substrate cleaning device including the same
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Application No.: US16019762Application Date: 2018-06-27
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Publication No.: US11302540B2Publication Date: 2022-04-12
- Inventor: Jong keun Oh , Kyeong bin Lim , Byung gook Kim
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Lee IP Law, P.C.
- Priority: KR10-2018-0004921 20180115
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/02 ; B08B3/02 ; B08B3/12 ; H01L21/687 ; B08B7/02 ; G06F1/00
Abstract:
A support device for a substrate and a substrate cleaning apparatus, the support device including a support on which the substrate is loadable; a rotor that rotates the support; and an oscillator that oscillates the substrate in a direction perpendicular to a surface of the substrate, wherein the substrate oscillates according to a natural frequency of the substrate or a natural frequency of particles on the substrate.
Public/Granted literature
- US20190221451A1 SUBSTRATE SUPPORT DEVICE AND SUBSTRATE CLEANING DEVICE INCLUDING THE SAME Public/Granted day:2019-07-18
Information query
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