Invention Grant
- Patent Title: Semiconductor device and process of forming the same
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Application No.: US17060960Application Date: 2020-10-01
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Publication No.: US11302817B2Publication Date: 2022-04-12
- Inventor: Takuma Nakano
- Applicant: SUMITOMO ELECTRIC DEVICE INNOVATIONS, INC.
- Applicant Address: JP Kanagawa
- Assignee: SUMITOMO ELECTRIC DEVICE INNOVATIONS, INC.
- Current Assignee: SUMITOMO ELECTRIC DEVICE INNOVATIONS, INC.
- Current Assignee Address: JP Kanagawa
- Agency: Smith, Gambrell & Russell, LLP.
- Priority: JPJP2017-188461 20170928
- Main IPC: H01L31/072
- IPC: H01L31/072 ; H01L29/78 ; H01L29/40 ; H01L29/778 ; H01L29/66 ; H01L29/20 ; H01L29/417

Abstract:
A semiconductor device type of field effect transistor (FET) primarily made of nitride semiconductor materials is disclosed. The FET includes a nitride semiconductor stack providing primary and auxiliary active regions and an inactive region surrounding the active regions; electrodes of a source, a drain, and a gate; an insulating film covering the electrodes and the semiconductor stack; and a field plate on the insulating film. A feature of the FET of the invention is that the field plate is electrically in contact with the auxiliary active region through the opening provided in the insulating film.
Public/Granted literature
- US20210083092A1 SEMICONDUCTOR DEVICE AND PROCESS OF FORMING THE SAME Public/Granted day:2021-03-18
Information query
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