Invention Grant
- Patent Title: Determining a characteristic of a substrate
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Application No.: US16475626Application Date: 2017-04-25
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Publication No.: US11307027B2Publication Date: 2022-04-19
- Inventor: Peter Morovic , Jan Morovic , Hector Gomez Minano , Marcos Casaldaliga Albisu , Joan Jordi Coll Sicluna
- Applicant: Hewlett-Packard Development Company, L.P.
- Applicant Address: US TX Spring
- Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee Address: US TX Spring
- Agency: HP Inc. Patent Department
- International Application: PCT/US2017/029402 WO 20170425
- International Announcement: WO2018/199933 WO 20181101
- Main IPC: G01B11/30
- IPC: G01B11/30 ; B41F33/00 ; G01N21/86

Abstract:
A method is described in which a reflection is obtained of a laser light pattern reflected from a substrate. A reflection of diffuse light may be obtained from the substrate. A first parameter may be determined, relating to the substrate from the reflected laser light pattern. A second parameter may be determined, relating to the substrate from the reflected diffuse light and a characteristic of the substrate may be determined from the first and second parameters. A print apparatus and a machine-readable medium are also disclosed.
Public/Granted literature
- US20210325175A1 DETERMINING A CHARACTERISTIC OF A SUBSTRATE Public/Granted day:2021-10-21
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