Invention Grant
- Patent Title: Method and system for analyzing spatial resolution of microwave near-field probe and microwave microscope equipped with the system
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Application No.: US17227518Application Date: 2021-04-12
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Publication No.: US11307219B2Publication Date: 2022-04-19
- Inventor: Xiaolong Chen , Jia Sun , Kai Yang , Zhimin Liu
- Applicant: Xidian University
- Applicant Address: CN Xi'an
- Assignee: Xidian University
- Current Assignee: Xidian University
- Current Assignee Address: CN Xi'an
- Agency: Troutman Pepper Hamilton Sanders LLP
- Agent Christopher C. Close, Jr.
- Priority: CN202010282754.6 20200412
- Main IPC: G01Q60/22
- IPC: G01Q60/22 ; G01Q30/04

Abstract:
The present disclosure relates to the technical field of microwave test, and discloses a method and a system for analyzing the spatial resolution of a microwave near-field probe and a microwave microscope equipped with the system, wherein in the method for analyzing the spatial resolution of the microwave near-field probe, a three-dimensional equipotential surface in a sample is drawn by using an electric field formula calculated by a quasi-static theory; an equivalent model of a probe sample is established by using finite element analysis software, so as to change material characteristics in the area outside the three-dimensional equipotential surface; by observing the influence of changing materials on the potential distribution in the sample, a near-field action range of the probe is determined, and the spatial resolution of the microwave near-field scanning microscope is analyzed and calculated.
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