Invention Grant
- Patent Title: Method, apparatus, and system for forming code
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Application No.: US16492492Application Date: 2019-04-01
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Publication No.: US11307506B2Publication Date: 2022-04-19
- Inventor: Wei Wang
- Applicant: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Hubei
- Assignee: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Hubei
- Agency: Benesch, Friedlander, Coplan & Aronoff LLP
- Priority: CN201811568188.4 20181221
- International Application: PCT/CN2019/080810 WO 20190401
- International Announcement: WO2020/124860 WO 20200625
- Main IPC: G03F9/00
- IPC: G03F9/00 ; G03F7/20

Abstract:
The present application provides a method, an apparatus, and a system for forming code. The method includes while a substrate is transferred to an exposure machine, adjusting the substrate to align with an exposure alignment mark on the substrate with the exposure machine; forming a code formation area on the adjusted substrate by controlling the exposure machine; while the substrate formed with the code formation area is transferred to a code formation machine, adjusting the substrate to align the exposure alignment mark on the substrate with the code formation machine; and forming an identification code in the code formation area on the adjusted substrate by controlling the code formation machine.
Public/Granted literature
- US20210325790A1 METHOD, APPARATUS, AND SYSTEM FOR FORMING CODE Public/Granted day:2021-10-21
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