Invention Grant
- Patent Title: Method to obtain a height map of a substrate having alignment marks, substrate alignment measuring apparatus and lithographic apparatus
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Application No.: US16630668Application Date: 2018-06-05
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Publication No.: US11307507B2Publication Date: 2022-04-19
- Inventor: Bram Van Hoof , Arjan Hölscher , Alex Pascal Ten Brink , Petrus Franciscus Van Gils
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP17181378 20170714,EP17204344 20171129
- International Application: PCT/EP2018/064733 WO 20180605
- International Announcement: WO2019/011531 WO 20190117
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F9/00
Abstract:
The present invention provides a method to obtain a height map of a substrate having alignment marks, the method comprising the steps: determining a height of one or more locations or areas of the substrate, and determining the height map of the substrate on the basis of the determined height of the one or more locations or areas of the substrate and a shape model of the substrate.
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