Invention Grant
- Patent Title: Gain cell embedded DRAM in fully depleted silicon-on-insulator technology
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Application No.: US17257893Application Date: 2019-07-09
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Publication No.: US11309008B2Publication Date: 2022-04-19
- Inventor: Robert Giterman , Adam Teman
- Applicant: Bar-Ilan University
- Applicant Address: IL Ramat-Gan
- Assignee: Bar-Ilan University
- Current Assignee: Bar-Ilan University
- Current Assignee Address: IL Ramat-Gan
- International Application: PCT/IL2019/050764 WO 20190709
- International Announcement: WO2020/012470 WO 20200116
- Main IPC: G11C11/34
- IPC: G11C11/34 ; G11C11/404 ; G11C11/4091 ; G11C11/4096

Abstract:
An FD-SOI GC-edRAM gain cell includes: a write bit line terminal connected to a WBL; a read bit line terminal connected to a RBL; a write trigger terminal connected to a WWL, for inputting a write trigger signal; a read trigger terminal put connected to a RWL, for inputting a read trigger signal; at least one body voltage terminal connected to a respective body voltage; and multiple FD-SOI transistors. The FD-SOI transistors are interconnected to form a storage node for retaining a data signal. The bodies of at least two of the transistors are coupled in a single well to a body voltage terminal. The write trigger signal triggers writing an input data signal from the write bit line terminal to the storage node and the read trigger signal triggers outputting the retained data signal from the storage node to the read bit line terminal.
Public/Granted literature
- US20210272616A1 GAIN CELL EMBEDDED DRAM IN FULLY DEPLETED SILICON-ON-INSULATOR TECHNOLOGY Public/Granted day:2021-09-02
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