Invention Grant
- Patent Title: Apparatus and method for manufacturing a wafer
-
Application No.: US16182050Application Date: 2018-11-06
-
Publication No.: US11309177B2Publication Date: 2022-04-19
- Inventor: Ruggero Anzalone , Nicolo′ Frazzetto
- Applicant: STMICROELECTRONICS S.r.l.
- Applicant Address: IT Agrate Brianza
- Assignee: STMICROELECTRONICS S.r.l.
- Current Assignee: STMICROELECTRONICS S.r.l.
- Current Assignee Address: IT Agrate Brianza
- Agency: Seed IP Law Group LLP
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L29/16 ; H01L21/683 ; C23C16/01 ; C23C16/32

Abstract:
Various embodiments provide an apparatus and method for fabricating a wafer, such as a SiC wafer. The apparatus includes a support having a plurality of arms for supporting a substrate. The arms allows for physical contact between the support and the substrate to be minimized. As a result, when the substrate is melted, surface tension between the arms and molten material is reduced, and the molten material will be less likely to cling to the support.
Information query
IPC分类: