Invention Grant
- Patent Title: Copper based conductive paste and its preparation method
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Application No.: US16340101Application Date: 2019-02-22
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Publication No.: US11312870B2Publication Date: 2022-04-26
- Inventor: Jyongsik Jang
- Applicant: SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION
- Applicant Address: KR Seoul
- Assignee: SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION
- Current Assignee: SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION
- Current Assignee Address: KR Seoul
- Agency: Renaissance IP Law Group LLP
- Priority: KR10-2018-0042720 20180412
- International Application: PCT/KR2019/002214 WO 20190222
- International Announcement: WO2019/198929 WO 20191017
- Main IPC: C09D5/24
- IPC: C09D5/24 ; C09D7/65 ; C09D7/40 ; C09D7/20 ; C09D7/63 ; C09D7/62 ; C09D125/18

Abstract:
The present inventive concept relates to a copper based conductive paste and its preparation method. The copper based conductive paste comprises a copolymer-copper composite comprising an imidazole-silane copolymer with partially cross-linked structure and a copper powder, a solvent, a binder and an additive. The imidazole-silane copolymer with partially cross-linked structure is introduced into the copper powder whose surface is treated by a hydrochloric acid aqueous solution and a phosphoric acid aqueous solution. The imidazole-silane copolymer is polymerized by using an imidazole monomer represented by following formula 1, a silane monomer represented by following formula 2 and a cross-linking agent. In Formula 1, X represents a hydrogen atom (H) or a methyl group (—CH3), and R1 represents a vinyl group or an allyl group. In Formula 2, Y represents a methoxy group, a 2-methoxy ethoxy group or an acetoxy group, and R2 represents a vinyl group.
Public/Granted literature
- US20210324208A1 COPPER BASED CONDUCTIVE PASTE AND ITS PREPARATION METHOD Public/Granted day:2021-10-21
Information query
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