Invention Grant
- Patent Title: Vapor deposition mask, vapor deposition mask production method, and organic semiconductor element production method
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Application No.: US17157484Application Date: 2021-01-25
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Publication No.: US11313027B2Publication Date: 2022-04-26
- Inventor: Susumu Sakio , Katsuhiko Kishimoto , Koshi Nishida , Kozo Yano
- Applicant: HON HAI PRECISION INDUSTRY CO., LTD.
- Applicant Address: TW New Taipei
- Assignee: HON HAI PRECISION INDUSTRY CO., LTD.
- Current Assignee: HON HAI PRECISION INDUSTRY CO., LTD.
- Current Assignee Address: TW New Taipei
- Agency: ScienBiziP, P.C.
- Priority: JPJP2016-058312 20160323
- Main IPC: C23C14/04
- IPC: C23C14/04 ; C23C14/24 ; C23C14/12 ; B23K11/11 ; H01L51/50 ; H01L51/00

Abstract:
A vapor deposition mask (100) includes a resin layer (10) including a plurality of openings (11); a magnetic metal layer (20) located so as to overlap the resin layer, the magnetic metal layer including a mask portion (20a) having such a shape as to expose the plurality of openings and a peripheral portion (20b) located so as to enclose the mask portion; and a frame (30) secured to the peripheral portion of the magnetic metal layer. The resin layer is not joined to the mask portion of the magnetic metal layer but is joined to at least a part of the peripheral portion of the magnetic metal layer.
Public/Granted literature
Information query
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