Invention Grant
- Patent Title: Optical pattern generation device
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Application No.: US16498125Application Date: 2017-05-22
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Publication No.: US11314095B2Publication Date: 2022-04-26
- Inventor: Yukari Takada , Takayuki Yanagisawa
- Applicant: MITSUBISHI ELECTRIC CORPORATION
- Applicant Address: JP Tokyo
- Assignee: MITSUBISHI ELECTRIC CORPORATION
- Current Assignee: MITSUBISHI ELECTRIC CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- International Application: PCT/JP2017/018983 WO 20170522
- International Announcement: WO2018/216057 WO 20181129
- Main IPC: G02B27/09
- IPC: G02B27/09

Abstract:
An optical pattern generation device includes: a first laser light source for emitting first laser light; a first diffractive optical element for changing a phase of the first laser light depending on a position on a plane perpendicular to a propagating direction of the first laser light, and emitting laser light having a phase distribution; a second diffractive optical element for changing a phase of incident laser light depending on a position on a plane perpendicular to a propagating direction of the incident laser light, and emitting laser light for forming an optical pattern; and a transfer optical system disposed between the first and second diffractive optical elements, for transferring the phase distribution of the laser light emitted from the first diffractive optical element to a phase distribution of laser light incident on the second diffractive optical element.
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