Invention Grant
- Patent Title: Array substrate and method for manufacturing the same, display device and method for manufacturing the same
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Application No.: US16343964Application Date: 2018-09-27
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Publication No.: US11314135B2Publication Date: 2022-04-26
- Inventor: Chunping Long , Xinyin Wu , Yong Qiao
- Applicant: BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Beijing
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee Address: CN Beijing
- Agency: Nath, Goldberg & Meyer
- Agent Joshua B. Goldberg
- Priority: CN201721438535.2 20171101
- International Application: PCT/CN2018/107968 WO 20180927
- International Announcement: WO2019/085700 WO 20190509
- Main IPC: G02F1/1362
- IPC: G02F1/1362 ; G02F1/1368

Abstract:
Provided are an array substrate and a method for manufacturing the same, a display device and a method for manufacturing the same. In the array substrate, the drain of the thin film transistor is extended to form a drain extension line, wherein the drain extension line is between adjacent sub-pixel units of the pixel region, thus it can block the light at the boundary between the sub-pixel units, thereby avoiding light leakage duo to the disordered electric field at the boundary between the sub-pixel units. The array substrate of the present disclosure is suitable for a multi-domain oriented IPS mode array substrate. The drain extension line can be used as a light blocking strip to prevent light leakage due to the disordered electric field at the boundary between the sub-pixels, and is overlapped with the middle portion of the common electrode line to form a storage capacitor.
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