Invention Grant
- Patent Title: Residue detection using a luminance histogram
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Application No.: US16659408Application Date: 2019-10-21
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Publication No.: US11315232B2Publication Date: 2022-04-26
- Inventor: Dominic J. Benvegnu , Nojan Motamedi
- Applicant: Applied Materials, Inc
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc
- Current Assignee: Applied Materials, Inc
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: G06T7/00
- IPC: G06T7/00 ; G06T7/90 ; G06T7/41
Abstract:
A method of determining whether a substrate is properly polished includes obtaining an image of the substrate, obtaining intensity values of a luminance plane for the image, generating an intensity histogram from the intensity values of the luminance plane, and analyzing the intensity histogram to determine whether the intensity histogram meets one or more criteria.
Information query
