Invention Grant
- Patent Title: Structure variable type of a plasma source coil and a method for controlling the same
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Application No.: US17015520Application Date: 2020-09-09
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Publication No.: US11315764B2Publication Date: 2022-04-26
- Inventor: Woo Hyung Choi , Sang Woo Lee
- Applicant: Adaptive Plasma Technology Corp.
- Applicant Address: KR Icheon-si
- Assignee: Adaptive Plasma Technology Corp.
- Current Assignee: Adaptive Plasma Technology Corp.
- Current Assignee Address: KR Icheon-si
- Agency: Cantor Colburn LLP
- Priority: KR10-2020-0051158 20200428
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01L21/67
Abstract:
Provided is a structure variable type of a plasma source coil and a method for controlling the same. The plasma source coil comprises a plurality of coil branches extending in a spiral shape based on a central part, wherein at least one coil branch has a structure in which the extending direction or a tilting level can be adjusted.
Public/Granted literature
- US20210335583A1 STRUCTURE VARIABLE TYPE OF A PLASMA SOURCE COIL AND A METHOD FOR CONTROLLING THE SAME Public/Granted day:2021-10-28
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