Invention Grant
- Patent Title: Fluorine ion implantation method and system
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Application No.: US16713381Application Date: 2019-12-13
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Publication No.: US11315791B2Publication Date: 2022-04-26
- Inventor: Ying Tang , Sharad N. Yedave
- Applicant: ENTEGRIS, INC.
- Applicant Address: US MA Billerica
- Assignee: ENTEGRIS, INC.
- Current Assignee: ENTEGRIS, INC.
- Current Assignee Address: US MA Billerica
- Agency: Entegris, Inc.
- Main IPC: H01L21/265
- IPC: H01L21/265 ; H01J37/317 ; H01J37/32
Abstract:
A method and system for fluorine ion implantation is described, where a fluorine compound capable of forming multiple fluorine ionic species is introduced into an ion implanter at a predetermined flow rate. Fluorine ionic species are generated at a predetermined arc power and source magnetic field, providing an optimized beam current for the desired fluorine ionic specie. The desired fluorine ionic specie, such as one having multiple fluorine atoms, is implanted into the substrate under the selected operating conditions.
Information query
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